3M Ion Beam Raster / Gate Controller, Pulse Gating + Beam Deflection, Rack Mount, Untested

The 3M Ion Beam Raster / Gate Controller is a 1980s-1990s era rack-mount laboratory instrument designed to drive electrostatic deflection plates in an ion-beam vacuum system. It provides operator control over beam-position offset on the X and Y axes, raster amplitude (raster size), electronic gate sizing for restricting secondary-ion acquisition to the central uniform-current region of the raster pattern (a standard SIMS technique), beam blanking via the pulse-gating signal path, and overall raster intensity from 0 to 100 percent. The front panel features analog rotary controls and BNCs for X, Y, and Z signal access; the rear panel exposes the deflection-voltage output, pulse-gating in/out, and beam-deflection power input. The unit carries no commercial nameplate, model number, or serial number, consistent with internally-built or contract-built laboratory hardware. It appears physically complete in studio photographs but has not been functionally tested and is sold AS-IS with no warranty. Compatible vacuum systems and deflection-plate assemblies are not included.

Form factor: 19-inch rack-mount instrument. Dimensions: 16.25 x 9 x 3.5 in. Weight: 14 lb. Controls: Beam Position X, Beam Position Y, Raster Size, Gate Size, Raster Fast/Slow, Raster Intensity 0-100%. Front I/O: BNC X, Y, Z. Rear I/O: Pulse Gating In/Out, Beam Deflection Power In, Deflection Voltage Out. Power: AC line (assumed 120 VAC, single phase, under 1A). Application: drives electrostatic deflection plates in an ion-beam vacuum system (SIMS, ion implantation, ion beam etching, thin-film deposition). Manufacturer: 3M (medium confidence). Model: Ion Beam Raster / Gate. Serial: not present. Test status: UNTESTED, AS-IS.